PVD Substrate Heater Element from China
A resistively heated platform that maintains substrate temperatures up to 800°C during PVD film deposition. It is designed for integration into physical vapor deposition apparatus of subheading 8543.70, essential for controlling film properties.
Duty Rate — China → Canada
0%
Import Tips
• Declare as a part of PVD apparatus under 8543.90.00
• Provide thermal specifications and safety certifications
• Check if the heater is a standard electric heating element that could be classified under heading 8516