PVD Plasma Cleaning Head from Japan
An RF-powered electrode assembly for pre-deposition substrate cleaning in PVD chambers. It is part of physical vapor deposition apparatus in subheading 8543.70, removing contaminants via reactive plasma to enhance adhesion.
Duty Rate — Japan → Canada
0%
Import Tips
• Declare as a part of PVD apparatus under 8543.90.00
• Provide evidence of its RF power requirements
• Verify if the head is a standard plasma generator that could be classified under other headings