Novellus (Lam Research) SPEED PVD from Japan
> The Novellus (Lam Research) SPEED PVD apparatus uses ionized metal plasma technology for advanced copper interconnect filling in semiconductor devices. It features collimation and resputtering capabilities for precise deposition. This apparatus qualifies under tariff item 8543.70.00 as an "other machine" with an individual function for PVD in semiconductor manufacturing.
Duty Rate — Japan → Canada
0%
Import Tips
• > Emphasize the PVD function and the specific technology (ionized metal plasma) in the customs documentation
• If the system is used for semiconductor manufacturing, consider if heading 84.86 might apply, but note that PVD is specifically covered by 8543.70.00
• Provide a detailed process description to avoid misclassification