Kurt J. Lesker PVD 75 Physical Vapor Deposition System from China
Kurt J. Lesker PVD 75 Physical Vapor Deposition System is a compact apparatus used for thin film deposition via evaporation or sputtering in semiconductor and optics manufacturing. It incorporates vacuum chambers and electron beam sources. This apparatus falls under tariff item 8543.70.00 as an electrical machine with individual functions not specified elsewhere in Chapter 85.
Duty Rate — China → Canada
0%
Import Tips
• Provide CBSA with the system's technical manual to confirm classification
• Verify if e-beam sources are included in the declared value
• Consider a ruling for multi-function equipment