Reticles Mask Cleaning Station from Japan
>- An automated wet and megasonic cleaning system designed specifically for cleaning photomasks and reticles without damaging patterns. It is classified under tariff item 8486.40.00 as equipment for mask manufacturing preparation processes.
Duty Rate — Japan → Canada
PGA flags
No agency flag on this HTS number in the CBSA Single Window matching criteria.
CBSA Single Window matching criteria, unknown
Import Tips
• >- Provide the CBSA with evidence that the cleaning station is designed exclusively for photomasks and reticles, not for wafers or other substrates, to support classification under 8486.40.00
• If the station uses megasonic technology that could be classified elsewhere, emphasize its specific application to mask cleaning
• Keep records of the cleaning chemistry and process parameters to demonstrate its dedicated use