Mask Reticle Repair Workstation from United States
>- A focused ion beam (FIB) workstation used to repair defects in photomasks and reticles by milling away unwanted material and depositing repair material. Because it is designed solely or principally for the repair of masks and reticles, it is classified under tariff item 8486.40.00.
Duty Rate — United States → Canada
0%
Import Tips
• >- Provide the CBSA with a detailed description of the FIB technology and its specific application to mask and reticle repair to avoid misclassification as a general microscopy system
• If the workstation includes a scanning electron microscope column, confirm that the principal function remains repair, not inspection, to stay within 8486.40.00
• Keep records of the end-user's semiconductor manufacturing activity in case the CBSA requests proof of use