Binary Mask Etching Equipment from Japan
> A reactive ion etching system optimized for pattern transfer in binary photomask production, essential for creating precise mask patterns. This machine is used solely or principally for the manufacture of masks and reticles for semiconductor production. It falls under tariff item 8486.40.00 as a machine specified in Note 11(C) to Chapter 84, specifically for mask manufacturing.
Duty Rate — Japan → Canada
PGA flags
No agency flag on this HTS number in the CBSA Single Window matching criteria.
CBSA Single Window matching criteria, unknown
Import Tips
• > Provide CBSA with evidence that the etching system is dedicated to photomask production, including process details
• Explore duty relief under the Machinery Program for manufacturing equipment
• Keep detailed technical specifications to support the classification and expedite customs clearance