Epitaxial Reactor Vapor Dryer from United States
A dryer integrated with MOCVD reactors to vaporize solvents from epitaxial GaN/SiC wafers using heated inert gas flows. It is classified under 8419.39.00 as other dryers for vaporizing and drying in semiconductor layer deposition.
Duty Rate — United States → Canada
0%
Import Tips
• Ensure the dryer is presented separately from the MOCVD reactor; if combined, classification may change
• Provide the CBSA with process details showing vaporizing function
• Verify eligibility for duty relief under the Machinery Remission Program