Wafer Oxidation Furnace from United States
A non-electric horizontal furnace growing thermal oxide layers on semiconductor wafers via steam or dry oxygen ambient at 900-1200°C. It is fundamental for MOS gate dielectrics and isolation structures.
Duty Rate — United States → Canada
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- TC
Vehicles Program - CMVSS Appendix G · Required
Transport Canada: TC Vehicles Program - CMVSS Appendix G requires review / declaration data. CBSA's Single Window matching criteria match this classification number (Equal To 8417800000).
CBSA Single Window matching criteria, unknown
Import Tips
• Classify as a non-electric industrial furnace under 8417.80.00; provide technical documentation on the oxidation process
• Ensure gas handling systems are compliant with Canadian safety regulations
• Verify if the furnace is considered a complete unit or if parts are classified separately