Wafer Oxidation Furnace from Japan
A non-electric horizontal furnace growing thermal oxide layers on semiconductor wafers via steam or dry oxygen ambient at 900-1200°C. It is fundamental for MOS gate dielectrics and isolation structures.
Duty Rate — Japan → Canada
0%
Import Tips
• Classify as a non-electric industrial furnace under 8417.80.00; provide technical documentation on the oxidation process
• Ensure gas handling systems are compliant with Canadian safety regulations
• Verify if the furnace is considered a complete unit or if parts are classified separately