Tantalum Sputtering Target from Japan
A disk-shaped tantalum sputtering target used for physical vapor deposition in semiconductor production. This fabricated article is classified under this tariff item as an 'other' tantalum article, with high purity ensuring high-quality thin-film deposits.
Duty Rate — Japan → Canada
0%
Import Tips
• Ensure the target is not classified as a part of semiconductor manufacturing equipment (Chapter 85) if it is sold with a sputtering machine
• Provide purity certificates to support classification
• Check if the target requires any export permits from the country of origin