Ultra-Fine Tantalum Powder <1 Micron
Nanoscale tantalum powder (D50 <1 micron) for advanced coatings and catalysts. Tariff item 8103.20.00 applies to this unwrought, high-purity powder form, with particle size enabling unique applications without further processing.
Import Duty Rates by Country of Origin
| Origin Country | MFN Tariff | Surtaxes | Total Effective Rate |
|---|---|---|---|
| 🇨🇳China | Free | — | Free |
| 🇲🇽Mexico | Free | — | Free |
| 🇺🇸United States | Free | — | Free |
| 🇩🇪Germany | Free | — | Free |
| 🇯🇵Japan | Free | — | Free |
More Specific Codes
This product may fall under a more specific subheading:
Alternative Classifications
This product could be classified differently depending on its characteristics or intended use.
If the powder is mixed with catalysts on a support
Supported catalysts are classified under chemical products.
Not sure which classification is right?
The Tariff Assistant works through the GRI rules on your specific product to reach the right tariff item — and can price the duty on it in the same conversation.
Import Tips & Compliance
• Ensure the powder is not sintered or coated; raw nanoscale powder qualifies as unwrought
• Keep particle size distribution data to support classification
• Check if the powder meets the sieve definition of 'powders' (90% passing 1 mm)
Related Products under Tariff item 8103.20.00
Atomized Tantalum Powder -325 Mesh
Gas-atomized tantalum powder with spherical particles under 44 microns, intended for thermal spraying and metal injection molding. It is classified as unwrought tantalum powder under tariff item 8103.20.00 because it has not been sintered or further worked.
Atomized Tantalum Powder -45 Micron
Gas-atomized tantalum powder with particle size under 45 microns, ideal for 3D printing and thermal spraying. This powder is unwrought under tariff item 8103.20.00 as it is in powder form and not sintered or shaped. Purity exceeds 99.95%, qualifying as high-purity unwrought tantalum.
Electron Beam Melted Tantalum Powder
Electron beam melted tantalum powder for aerospace implants and medical devices. Despite the advanced production method, this powder is unwrought under tariff item 8103.20.00 as it is in powder form and not further processed. Purity exceeds 99.9%.
High-Purity Tantalum Granules
Irregular-shaped tantalum granules (1-5 mm) produced by gas atomization, used in capacitor manufacturing and powder metallurgy. This unwrought form falls under tariff item 8103.20.00 as 'other' tantalum powders and granules, excluding sintered products.
High-Purity Tantalum Powder 99.99%
Ultra-high purity tantalum powder (4N grade, 99.99%) for semiconductor sputtering targets. This powder is unwrought under tariff item 8103.20.00 as it is in powder form and not further processed. It exceeds the purity threshold defined in the chapter notes.
High-Purity Tantalum Sintered Bar
High-purity tantalum sintered bar stock, 99.95% purity, produced by sintering tantalum powder into a solid bar form. This product is unwrought as it has not been further worked beyond the sintering process, and is explicitly included in tariff item 8103.20.00 as bars and rods obtained simply by sintering. It is primarily used as anode material in capacitor production.