Tantalum Metal Powder for Sputtering Targets from China
Ultra-fine tantalum powder (1-10 microns) for plasma spraying and sputtering target production in semiconductor manufacturing. Classified under tariff item 8103.20.00 as unwrought tantalum powder, not sintered or shaped.
Duty Rate — China → Canada
0%
Import Tips
• Confirm the powder is not sintered into targets before import; raw powder qualifies as unwrought
• Keep purity and particle size data to support classification
• Check if the end use (sputtering targets) requires additional permits under Canadian regulations