HFC-23 Calibration Gas Standard
A NIST-traceable calibration gas standard containing known concentrations of trifluoromethane (HFC-23) in a balance gas, used for calibrating greenhouse gas monitoring equipment. This mixture falls under tariff item 3827.59.00 as it contains HFC-23, a halogenated derivative of methane, and does not contain CFCs or HCFCs. It is not a separate chemically defined compound, but a mixture, and is not excluded by Chapter 38 notes.
Import Duty Rates by Country of Origin
| Origin Country | MFN Tariff | Surtaxes | Total Effective Rate |
|---|---|---|---|
| 🇨🇳China | Free | — | Free |
| 🇲🇽Mexico | Free | — | Free |
| 🇺🇸United States | Free | — | Free |
| 🇩🇪Germany | Free | — | Free |
| 🇯🇵Japan | Free | — | Free |
Alternative Classifications
This product could be classified differently depending on its characteristics or intended use.
If the mixture contains other halogenated derivatives not covered by the specific subheadings
Covers other mixtures of halogenated derivatives of methane, ethane, or propane not elsewhere specified.
Not sure which classification is right?
The Tariff Assistant works through the GRI rules on your specific product to reach the right tariff item — and can price the duty on it in the same conversation.
Import Tips & Compliance
• Ensure the mixture is accompanied by a certificate of analysis or specification sheet to confirm HFC-23 content and absence of CFCs/HCFCs
• Declare the product under tariff item 3827.59.00 and be prepared to provide technical documentation to the CBSA if requested
• Verify if the gas mixture requires any import permits under Canada's Ozone-Depleting Substances Regulations, as HFCs are controlled substances
Related Products under Tariff item 3827.59.00
HFC-23 Fire Suppression Blend
A clean agent fire suppression blend containing HFC-23, designed for use in data centers and electrical equipment protection. This product is a mixture containing trifluoromethane and is free of CFCs and HCFCs, meeting the criteria for tariff item 3827.59.00. It is not a separate chemically defined compound and is not excluded by Chapter 38 notes.
HFC-23 Leak Detection Gas Mixture
A tracer gas mixture containing HFC-23, used for leak detection in HVAC systems. This blend falls under tariff item 3827.59.00 as it contains trifluoromethane and is free of CFCs and HCFCs. It is a mixture, not a separate chemically defined compound, and is not excluded by Chapter 38 notes.
HFC-23 Medical Aerosol Propellant Blend
This is a pharmaceutical-grade propellant blend containing trifluoromethane (HFC-23) used in metered-dose inhalers and nasal sprays. It falls under tariff item 3827.59.00 because it is a mixture containing a halogenated derivative of methane (HFC-23) that does not contain chlorofluorocarbons (CFCs) or hydrochlorofluorocarbons (HCFCs). The product meets USP standards for medical applications and is not a separate chemically defined compound, which would be excluded from Chapter 38.
HFC-23 Refrigerant Blend for Industrial Chillers
A specialized refrigerant mixture containing trifluoromethane (HFC-23), used in low-temperature industrial chillers and cryogenic applications. This product is a mixture containing HFC-23 and is free of CFCs and HCFCs, falling under tariff item 3827.59.00. It is not a separate chemically defined compound and is not excluded by Chapter 38 notes.
PFC-116 Chemical Vapor Deposition Precursor
A perfluorohexane (PFC-116) mixture used as a precursor gas in chemical vapor deposition for optical coatings. This product contains perfluorocarbons (PFCs) and is free of CFCs and HCFCs, falling under tariff item 3827.59.00. It is a mixture, not a separate chemically defined compound, and is not excluded by Chapter 38 notes.
PFC-14 Semiconductor Etching Gas Mixture
A perfluorocarbon (PFC-14, CF4) based plasma etching gas mixture used in microchip manufacturing. This product contains perfluorocarbons and is free of CFCs and HCFCs, falling under tariff item 3827.59.00. It is a mixture, not a separate chemically defined compound, and is not excluded by Chapter 38 notes.