HFC-23 Semiconductor Etch Gas from Japan
Ultra-high purity trifluoromethane (HFC-23) for semiconductor plasma etching is a separate chemically defined organic compound. It is a saturated fluorinated derivative of acyclic hydrocarbons, classified under tariff item 2903.41.00. The high purity grade does not change the chemical classification.
Duty Rate — Japan → Canada
0%
Import Tips
• Provide a certificate of analysis confirming purity (e.g
• 99.999%) and absence of dopants or diluents
• Ensure proper dangerous goods documentation, as HFC-23 is a compressed gas
• Check if the product qualifies for duty relief under Canada's scientific or industrial equipment programs