Boron Carbide Sputtering Target Material from Germany
High-density boron carbide material prepared for thin-film deposition via sputtering in semiconductor manufacturing. This chemically defined boron carbide in raw target form is classified under tariff item 2849.90.00 as a carbide, whether or not chemically defined.
Duty Rate — Germany → Canada
0%
Import Tips
• Ensure the target is not mounted on a backing plate, as that may change classification
• Provide documentation that the material is in raw form, not a finished article
• Check if the target is for semiconductor use, which may require end-use certificates